Kitakyushu, Japan

Hidetomi Haga

This inventor holds 1 USPTO granted patent. Top assignee: Asahi Glass Company, Limited. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hidetomi Haga. Retrieved from https://idiyas.com/inventor/hidetomi-haga

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Hidetomi Haga: Innovator in Blasting Technology

Introduction

Hidetomi Haga is a notable inventor based in Kitakyushu, Japan. He has made significant contributions to the field of blasting technology, particularly through his innovative patent. His work is recognized for its practical applications in various industries.

Latest Patents

Haga holds a patent for a "Blasting medium and blasting method employing such medium." This invention involves a blasting medium composed of a granulated product that primarily consists of a water-soluble inorganic salt. The medium has a weight average grain size ranging from 1 to 10 mm, showcasing Haga's focus on enhancing the efficiency and safety of blasting operations.

Career Highlights

Hidetomi Haga is associated with Asahi Glass Company, Limited, where he applies his expertise in developing advanced materials and technologies. His role at the company has allowed him to contribute to innovative solutions that address industry challenges.

Collaborations

Haga has worked alongside esteemed colleagues such as Hachiro Hirano and Teiji Kawada. Their collaborative efforts have furthered advancements in their respective fields, demonstrating the importance of teamwork in innovation.

Conclusion

Hidetomi Haga's contributions to blasting technology through his patent reflect his dedication to innovation. His work continues to influence the industry, showcasing the impact of inventive minds in shaping practical solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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