This inventor holds 1 USPTO granted patent. Top assignee: Matsushita Electric Industrial Co., Ltd.. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008
Title: Hideto Uchijima: Substrate Processing Innovation.
Introduction
Hideto Uchijima is an inventor associated with Toyama, Japan, and Matsushita Electric Industrial Co., Ltd. His work includes an invention focused on improving the uniformity of substrate processing.
Latest Patents
Uchijima is credited with 1 patent: “Substrate Processing Apparatus and Substrate Processing Method.” The invention describes a pressure-reducible reaction chamber, a shower head that supplies processing gas through a perforated gas diffusion plate, and a support for holding a substrate. In the plate’s peripheral region, the through-holes have inlets larger than their outlets. This design helps distribute processing gas uniformly, supporting more consistent film deposition and film etching.
Career Highlights
Uchijima’s listed patent reflects work on semiconductor and substrate-processing equipment. The disclosed approach addresses gas distribution within the processing chamber to promote uniform treatment across a substrate.
Collaborations
His listed coworkers include Hiroyuki Satoh and Toshio Matsubara. The patent is associated with Matsushita Electric Industrial Co., Ltd.
Conclusion
Hideto Uchijima’s patent presents a gas-diffusion design intended to improve the consistency of substrate processing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile