Hiroshima, Japan

Hidetaka Sada

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Jukogyo Kabushiki Kaisha. Active years: 1980.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hidetaka Sada. Retrieved from https://idiyas.com/inventor/hidetaka-sada

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 1980

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1 patent (USPTO):Explore Patents

Title: Hidetaka Sada: Innovator in Tracing Technology

Introduction

Hidetaka Sada is a notable inventor based in Hiroshima, Japan. He has made significant contributions to the field of tracing technology, particularly with his innovative designs that enhance precision and efficiency.

Latest Patents

Hidetaka Sada holds a patent for a tracer head that enables three-dimensional tracing of model surfaces. This tracer head is designed with a base frame, a tracer shaft, and a stylus that allows for accurate tracing. The invention includes several supports for the tracer shaft, each designed to provide both moderate and strong resiliency in different directions. Additionally, it features displacement detectors and a cylindrical transmission member that enhances the functionality of the stylus.

Career Highlights

Hidetaka Sada is associated with Mitsubishi Jukogyo Kabushiki Kaisha, where he has been instrumental in developing advanced tracing technologies. His work has been recognized for its innovative approach to solving complex problems in model surface tracing.

Collaborations

Hidetaka has collaborated with notable coworkers such as Hisanori Abiru and Yoshiaki Nakao, contributing to the advancement of their projects and innovations.

Conclusion

Hidetaka Sada's contributions to tracing technology exemplify his commitment to innovation and precision. His patent for the tracer head showcases his ability to create effective solutions in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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