Osaka, Japan

Hideshi Makita


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 21(Granted Patents)


Location History:

  • Tenri, JP (1991)
  • Osaka, JP (2014)

Company Filing History:


Years Active: 1991-2014

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2 patents (USPTO):Explore Patents

Title: Hideshi Makita: Innovator in Substrate Cleaning and Display Technology

Introduction

Hideshi Makita is a prominent inventor based in Osaka, Japan. He has made significant contributions to the fields of substrate cleaning and display technology. With a total of 2 patents, his work has been instrumental in advancing these technologies.

Latest Patents

One of Hideshi Makita's latest patents is a substrate cleaning apparatus. This innovative device includes a cleaning plate, a vibration unit for vibrating the cleaning plate, and a suction unit designed to suck the upper surface of a substrate without making contact. The moving mechanism allows the cleaning plate to move relative to the substrate, ensuring effective cleaning while preventing scratches.

Another notable patent is for a display device that improves insulation between conductors. In this liquid crystal display apparatus, an integrated circuit for driving the liquid crystal is mounted on the glass substrate. This design reduces the size and weight of the display while ensuring that the optical characteristics of the liquid crystals are effectively controlled.

Career Highlights

Hideshi Makita is currently employed at Sharp Kabushiki Kaisha Corporation, where he continues to innovate in the field of display technology. His work has garnered attention for its practical applications and advancements in efficiency.

Collaborations

Throughout his career, Hideshi has collaborated with notable coworkers, including Akihiro Kawashima and Hirokazu Yoshida. These collaborations have contributed to the development of cutting-edge technologies in their respective fields.

Conclusion

Hideshi Makita's contributions to substrate cleaning and display technology highlight his role as a key innovator in these industries. His patents reflect a commitment to improving efficiency and functionality in technology.

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