Abiko, Japan

Hideo Tsuda


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: Hideo Tsuda: Innovator in Photo-Curable Resist Resin Composition

Introduction

Hideo Tsuda is a notable inventor based in Abiko, Japan. He has made significant contributions to the field of materials science, particularly in the development of photo-curable resist resin compositions for electroless plating. His innovative work has led to advancements in the manufacturing processes used in various industries.

Latest Patents

Hideo Tsuda holds 1 patent for a photo-curable resist resin composition designed for electroless plating. This composition includes an epoxy resin with specific viscosity and glycidyl ether groups, an oxirane ring-containing compound, and a photo-sensitive aromatic onium salt. The resist film produced from this composition exhibits excellent soldering heat resistance, solvent resistance, and electrical insulation, making it suitable for high-performance applications.

Career Highlights

Tsuda is associated with Hitachi, Ltd., where he has been instrumental in advancing technologies related to resist materials. His work has not only contributed to the company's portfolio but has also impacted the broader field of electronics and materials engineering.

Collaborations

Throughout his career, Hideo Tsuda has collaborated with esteemed colleagues such as Kiyoshi Ozaki and Atsushi Mori. These partnerships have fostered innovation and have led to the successful development of new materials and processes.

Conclusion

Hideo Tsuda's contributions to the field of photo-curable resist resin compositions highlight his role as a key innovator in materials science. His work continues to influence the industry and pave the way for future advancements.

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