Company Filing History:
Years Active: 1985-2023
Title: Hideo Numata: Innovator in Semiconductor Technology and Flow Measurement
Introduction
Hideo Numata is a prominent inventor based in Tokyo, Japan, known for his contributions to semiconductor technology and flow measurement devices. With a total of three patents to his name, Numata has made significant advancements in the field, particularly through his innovative methods and devices.
Latest Patents
Numata's latest patents include a semiconductor device manufacturing method and a vortex flow meter. The semiconductor device manufacturing method involves creating a stacked substrate by repeatedly stacking substrates that contain multiple chip regions. This method allows for precise cutting in the stacking direction to separate the substrate into distinct stacked bodies. The process includes bonding various surfaces of the substrates and thinning specific surfaces to enhance performance.
The vortex flow meter, on the other hand, features a bluff body that generates a vortex train as fluid flows past it. This vortex train creates pressure variations that correlate with the fluid's flow rate. The flow meter detects these variations using a pressure sensor, which converts the pressure changes into an electric signal. The design includes a pressure sensing chamber and a drain port to manage fluid flow effectively.
Career Highlights
Throughout his career, Hideo Numata has worked with notable companies such as Oval Engineering Co., Ltd. and Kioxia Corporation. His experience in these organizations has contributed to his expertise in semiconductor manufacturing and flow measurement technologies.
Collaborations
Numata has collaborated with talented individuals in his field, including Naoki Matsubara and Yutaka Ogawa. These partnerships have likely fostered innovation and the exchange of ideas, further enhancing his contributions to technology.
Conclusion
Hideo Numata's work in semiconductor technology and flow measurement has established him as a key figure in his field. His innovative patents reflect his commitment to advancing technology and improving device performance. His contributions continue to influence the industry and inspire future innovations.