Iwaki, Japan

Hideo Munakata

This inventor holds 1 USPTO granted patent. Top assignee: Kureha Kagaku Kogyo Kabushiki Kaisha. Active years: 1984.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideo Munakata. Retrieved from https://idiyas.com/inventor/hideo-munakata

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 1984

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1 patent (USPTO):Explore Patents

Title: Hideo Munakata: Innovator in Dielectric Film Technology

Introduction

Hideo Munakata is a notable inventor based in Iwaki, Japan. He has made significant contributions to the field of materials science, particularly in the development of dielectric films. His innovative work has led to advancements that enhance the performance of various electronic devices.

Latest Patents

Munakata holds a patent for a dielectric film, which is prepared by molding a resin compound of polyvinylidene fluoride mixed with polycarbonate and/or thermoplastic polyester. This film is then stretched in at least one direction, resulting in excellent dielectric properties. His invention is crucial for applications requiring high-performance materials.

Career Highlights

Hideo Munakata is associated with Kureha Kagaku Kogyo Kabushiki Kaisha, a company known for its focus on advanced materials and chemicals. His work at Kureha has allowed him to explore innovative solutions in the field of dielectric materials.

Collaborations

Munakata has collaborated with notable colleagues, including Syuuzi Terasaki and Mitsuru Ohta. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Hideo Munakata's contributions to dielectric film technology exemplify the impact of innovation in materials science. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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