This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignees: Hitachi Metals, Ltd., Riken Corporation. Active years: 2011-2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Hyogo, JP (2011)
- Kobe, JP (2020)
Company Filing History:


Years Active: 2011-2020
Title: Hideo Kitamura: Innovator in Magnetic Devices
Introduction
Hideo Kitamura is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of magnetic devices, holding 2 patents that showcase his innovative spirit and technical expertise.
Latest Patents
Kitamura's latest patents include an Insertion Device and an Undulator. The Insertion Device features a first and second magnet array, along with a gap drive mechanism that allows for vertical movement of the magnet support bodies. This device is designed to change the gap between the magnet arrays, incorporating a cancellation spring mechanism to counteract the suction force between them. The Undulator, on the other hand, comprises a first magnetic circuit that forms a periodic magnetic field, supported by a first support body. It also includes a second magnetic circuit arranged opposite the first, creating a space for an electron beam to pass through, all within a vacuum chamber for optimal performance.
Career Highlights
Throughout his career, Hideo Kitamura has worked with prominent companies such as Hitachi Metals, Ltd. and Riken Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking projects in the field of magnetics.
Collaborations
Kitamura has collaborated with esteemed colleagues, including Toru Hara and Takashi Tanaka. These partnerships have further enriched his work and led to advancements in technology.
Conclusion
Hideo Kitamura's innovative contributions to magnetic devices highlight his expertise and dedication to the field. His patents reflect a deep understanding of complex mechanisms and a commitment to advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile