Hideo Kitagawa

Title: Hideo Kitagawa: Innovator in Dielectric Film Technology

Introduction

Hideo Kitagawa is a prominent inventor based in Utsunomiya, Japan. He has made significant contributions to the field of dielectric film technology, holding a total of 10 patents. His innovative approaches have advanced the methods of forming dielectric films, which are crucial in various electronic applications.

Latest Patents

Among his latest patents, Kitagawa has developed a process for forming dielectric films that contain metal atoms, silicon atoms, and oxygen atoms on a silicon substrate. This process involves several steps, including oxidizing the silicon substrate to create a silicon dioxide film, forming a metal film in a non-oxidizing atmosphere, and subsequently heating to diffuse the metal atoms into the silicon dioxide film. Another notable patent describes a method of forming dielectric films that includes a metal silicate on a silicon substrate. This method also consists of oxidizing the silicon substrate, irradiating ions to create a reaction-accelerating layer, and laminating a metal film to form a metal silicate film.

Career Highlights

Throughout his career, Hideo Kitagawa has worked with notable companies such as Canon Kabushiki Kaisha and Canon Anelva Corporation. His work in these organizations has allowed him to refine his expertise in dielectric film technology and contribute to various innovative projects.

Collaborations

Kitagawa has collaborated with esteemed colleagues, including Nobumasa Suzuki and Shinzo Uchiyama. These partnerships have fostered a creative environment that has led to significant advancements in their field.

Conclusion

Hideo Kitagawa's contributions to dielectric film technology have established him as a key figure in the industry. His innovative patents and collaborations reflect his commitment to advancing technology in electronics.