Hideo Ichinose

Title: Hideo Ichinose: Innovator in Semiconductor Technology

Introduction

Hideo Ichinose is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on advanced manufacturing methods that enhance the efficiency and precision of semiconductor devices.

Latest Patents

Ichinose's latest patents include a dry etching method and a high precision pattern forming method for manufacturing semiconductor devices. The dry etching method involves sequentially laminating a first insulating layer containing carbon and a second insulating layer also containing carbon on a substrate. This method allows for the formation of grooves in the first insulating layer by etching it with the second insulating layer used as a mask. The removal of the second insulating layer is achieved using a reactive gas containing carbon atoms and at least one of oxygen atoms, hydrogen atoms, or nitrogen atoms. The high precision pattern forming method utilizes a soluble thin film that can be removed without ashing, thereby simplifying the manufacturing process.

Career Highlights

Hideo Ichinose is currently employed at Kabushiki Kaisha Toshiba, a leading company in the technology sector. His innovative approaches have contributed to the advancement of semiconductor manufacturing techniques, making him a valuable asset to his organization.

Collaborations

Ichinose has collaborated with notable colleagues, including Shoji Seta and Tokuhisa Ohiwa. Their combined expertise has fostered a productive environment for innovation and development in semiconductor technology.

Conclusion

Hideo Ichinose's contributions to semiconductor technology through his patents and work at Toshiba highlight his role as a key innovator in the field. His advancements in manufacturing methods continue to influence the industry positively.