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For the Inventor, By the Inventor

Hitachi, Japan

Hideo Hagiwara

This inventor holds 20 USPTO granted patents, primarily in Photosensitive Resin Technology. Top assignees: Hitachi Chemical Company, Ltd., Hitachi, Ltd., Hitachi Chemical Company, Co.. Active years: 1991-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideo Hagiwara. Retrieved from https://idiyas.com/inventor/hideo-hagiwara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20

% Patents Active = 95.0

Average Co-Inventor Count = 5.1

ph-index = 6

Forward Citations = 94(Granted Patents)


Location History:

  • Ibaraki-ken, JP (2000 - 2001)
  • Hitachi, JP (1991 - 2006)

Company Filing History:

goldMedal19 out of 1,641 
 
Hitachi Chemical Company, Ltd.
 patents
silverMedal3 out of 42,740 
 
Hitachi, Ltd.
 patents
bronzeMedal1 out of 3 
 
Hitachi Chemical Company, Co.
 patents
where one patent can have more than one assignee

Years Active: 1991-2006

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Areas of Expertise:
Photosensitive Resin
Polyimide Precursor
Optical Recording
Photoinitiator Compositions
Alkali-Soluble Polymer
Naphthalocyanine Derivatives
Tetraazaporphin
Pattern-Forming Process
Amino Acids
Light Irradiation
Photosensitive Polyamide
Dicyanonaphthalene Derivatives
20 patents (USPTO):Explore Patents
1. 7153631 - Pattern-forming process using photosensitive resin composition (2006-12-26),
2. 6309791 - Polyimide precursor, polyimide and their use (2001-10-30),
3. 6197475 - Positive type photosensitive resin composition containing an alkali-soluble polymer and a compound which forms an amine compound with irradiation of light (2001-03-06),
4. 6194126 - Pattern-forming process using photosensitive resin composition (2001-02-27),
5. 6143475 - Polyimide precursor, polyimide and their use (2000-11-07),
6. 6071667 - Photosensitive resin composition containing a photosensitive polyamide (2000-06-06),
7. 5856059 - Photosensitive resin composition (1999-01-05),
8. 5847071 - Photosensitive resin composition (1998-12-08),
9. 5811218 - Photoinitiator compositions including amino acids, coumarin and (1998-09-22),
10. 5668248 - Photosensitive resin composition (1997-09-16),
11. 5484685 - Naphthalocyanine derivatives, production thereof, optical recording (1996-01-16),
12. 5472823 - Photosensitive resin composition (1995-12-05),
13. 5284943 - Tatraazaporphin, process for producing the same, as well as optical (1994-02-08),
14. 5268485 - Naphthalocyanine derivatives, production thereof and optical recording (1993-12-07),
15. 5217856 - Tetraazaporphin, process for producing the same, as well as optical (1993-06-08),

Title: Inventor Hideo Hagiwara

Introduction: Hideo Hagiwara is a renowned inventor based in Hitachi, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Hideo Hagiwara holds several patents in various technological domains, including advancements in robotics, artificial intelligence, and renewable energy solutions.

Career Highlights: With a career spanning over two decades, Hideo Hagiwara has worked with leading tech companies, such as Hitachi, to develop cutting-edge technologies that have revolutionized industries worldwide.

Collaborations: Throughout his career, Hideo Hagiwara has collaborated with top researchers, engineers, and scientists to bring his innovative ideas to life, resulting in successful products and solutions that have had a lasting impact.

Conclusion: Hideo Hagiwara's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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