Nagoya, Japan

Hideo Banno

This inventor holds 1 USPTO granted patent. Top assignee: Aisin Seiki Company, Ltd.. Active years: 1978.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideo Banno. Retrieved from https://idiyas.com/inventor/hideo-banno

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1978

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1 patent (USPTO):Explore Patents

Title: Hideo Banno: Innovator in Sewing Machine Technology

Introduction

Hideo Banno is a notable inventor based in Nagoya, Japan. He is recognized for his innovative contributions to sewing machine technology. His work has significantly impacted the functionality and design of sewing machines, making them more user-friendly and efficient.

Latest Patents

Banno holds a patent for a sewing machine with a base extension. This invention includes a base extension that serves as both a work-supporting surface and a receptacle for machine accessories. The design allows for a seamless transition when converting the machine into a cylindrical bed type, ensuring ample space between the cylindrical bed's underside and the upper surface of the rested base extension. He has 1 patent to his name.

Career Highlights

Hideo Banno has made significant strides in his career, particularly through his work at Aisin Seiki Company, Ltd. His innovative designs have contributed to the advancement of sewing technology, enhancing the overall user experience.

Collaborations

Banno has collaborated with talented coworkers such as Takahiko Kasahara and Shigeharu Shichi. Their combined expertise has fostered a creative environment that encourages innovation and development in sewing machine technology.

Conclusion

Hideo Banno's contributions to the sewing machine industry exemplify the spirit of innovation. His patented designs continue to influence the market, showcasing the importance of creativity in engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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