Hideo Akiya

Title: Hideo Akiya: Innovator in Thin Film Technology

Introduction

Hideo Akiya is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of thin film technology, holding a total of 4 patents. His innovative approaches have advanced the methods of thin film formation, which are crucial in various semiconductor applications.

Latest Patents

Akiya's latest patents include a thin film forming method that utilizes chemical vapor deposition with high-density plasma. In this method, a first thin film is formed on a semiconductor substrate with a step height. A base member, on which a second thin film is formed, is placed on the semiconductor substrate so that the two films oppose each other. The semiconductor substrate is heated to a first temperature to facilitate the formation of the second thin film on the first. Afterward, the base member is peeled off from the second thin film, which is then heated to a second temperature that exceeds the first. Another notable patent involves a thin film forming apparatus that includes a specimen holder and a transfer plate. This apparatus allows for the precise contact and heating of the substrate and thin film, ensuring effective thin film formation.

Career Highlights

Throughout his career, Akiya has worked with notable companies, including Nippon Telegraph and Telephone Corporation. His work has been instrumental in developing advanced technologies that enhance the efficiency and effectiveness of thin film applications.

Collaborations

Akiya has collaborated with esteemed colleagues such as Katsuyuki Machida and Hakaru Kyuragi. Their combined expertise has contributed to the success of various projects in the field of thin film technology.

Conclusion

Hideo Akiya's contributions to thin film technology through his innovative patents and collaborations highlight his role as a key figure in the semiconductor industry. His work continues to influence advancements in this critical area of technology.