The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 1986
Filed:
Apr. 09, 1985
Applicant:
Inventor:
Hideo Akiya, Isehara, JP;
Assignee:
Nippon Telegraph and Telephone Corp., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ; B29C / ;
U.S. Cl.
CPC ...
156643 ; 156646 ; 156652 ; 156655 ; 1566611 ; 156904 ; 2041 / ; 427 41 ; 427 431 ; 430296 ; 430312 ; 430313 ;
Abstract
A method of forming a resist micropattern in the manufacture of semiconductor devices. This method comprises first forming a multilayered resist films on a substrate, the uppermost film of which is selected to be a highly sensitive resist film 0.05 to 1.0 .mu.m in thickness, forming an uppermost resist pattern including a desired patterned groove, forming a mask film only in the groove, and dry etching the resist excluding that beneath the mask film in the groove thereby forming a resist micropattern.