Tokyo, Japan

Hidenori Kaneda

This inventor holds 1 USPTO granted patent. Top assignees: Fuji Photo Film Company, Limited, Toppan Printing Co., Ltd.. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hidenori Kaneda. Retrieved from https://idiyas.com/inventor/hidenori-kaneda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Hidenori Kaneda: Innovator in Film Pasting Technology

Introduction

Hidenori Kaneda is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of photomechanical processes through his innovative designs. His work primarily focuses on the development of advanced film pasting apparatuses.

Latest Patents

Hidenori Kaneda holds a patent for a film pasting apparatus. This apparatus is designed for pasting a color separation film onto a base film used in photomechanical processes. The device features a lower table equipped with optical sensors, an upper table with suction and pasting means, and a film tray for storing the color separation film. The apparatus also includes film picking and registering means to ensure precise alignment and placement of the film.

Career Highlights

Throughout his career, Hidenori Kaneda has worked with prominent companies such as Toppan Printing Co., Ltd. and Fuji Photo Film Company, Limited. His experience in these organizations has allowed him to refine his skills and contribute to the advancement of film technology.

Collaborations

Hidenori Kaneda has collaborated with notable colleagues, including Tetsuji Utsuda and Takashi Kominato. These partnerships have fostered innovation and creativity in their respective fields.

Conclusion

Hidenori Kaneda's contributions to film pasting technology highlight his role as an influential inventor. His patent and career achievements reflect his dedication to advancing photomechanical processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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