Fukushima, Japan

Hidenori Arai

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Nok Corporation. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hidenori Arai. Retrieved from https://idiyas.com/inventor/hidenori-arai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Hidenori Arai: Innovator in Sealing Technology

Introduction

Hidenori Arai is a notable inventor based in Fukushima, Japan. He has made significant contributions to the field of sealing technology, particularly with his innovative designs that enhance performance and reliability.

Latest Patents

Hidenori Arai holds a patent for a reciprocating seal, which is utilized in applications such as shock absorbers. This patent features a main seal lip with a two-step lip structure, consisting of a first lip and a second lip. Additionally, a series of protrusions extending in the direction of the shaft are formed on the sliding contact surface of the second lip. This design improves frictional force characteristics while simultaneously enhancing sealing performance.

Career Highlights

Arai is currently employed at Nok Corporation, where he continues to develop advanced sealing solutions. His work has been instrumental in pushing the boundaries of sealing technology, making significant impacts in various industries.

Collaborations

Hidenori Arai has collaborated with talented coworkers such as Shinobu Munekata and Kazuki Takeno. Their combined expertise has fostered an environment of innovation and creativity within their projects.

Conclusion

Hidenori Arai's contributions to sealing technology exemplify the spirit of innovation. His patented designs not only improve product performance but also set new standards in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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