Hitachinaka, Japan

Hidekimi Fudo


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 8(Granted Patents)


Location History:

  • Hitachinaka, JP (2011)
  • Tokyo, JP (2011)

Company Filing History:


Years Active: 2011

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2 patents (USPTO):Explore Patents

Title: Innovations from Hidekimi Fudo in Semiconductor Manufacturing

Introduction: Hidekimi Fudo, an inventive mind based in Hitachinaka, Japan, has made significant contributions to the field of semiconductor manufacturing. With two patents to his name, Fudo's work emphasizes precision and efficiency in semiconductor device fabrication.

Latest Patents: Fudo's most recent innovations include a Manufacturing Method and Manufacturing System of a Semiconductor Device. This patent outlines a process where the resist dimension of a pattern formed on a wafer is measured alongside the focus position in an exposure process. By estimating these parameters for additional exposure processes, Fudo's invention allows for the calculation of a focus offset value, which in turn enables an accurate exposure dose that optimally creates the desired resist pattern.

Another crucial patent, titled Manufacturing Method of Semiconductor Integrated Circuit Device, addresses the lithography process of semiconductor integrated circuit devices. Fudo’s method highlights the necessity of independently controlling exposure dose and focus value with high accuracy. By utilizing previously treated wafers and employing scatterometry techniques to acquire section profiles of photoresist, his approach improves the precision of both exposure parameters.

Career Highlights: Hidekimi Fudo is currently employed at Renesas Electronics Corporation, a prominent player in the semiconductor industry. His role involves ongoing research and development, focusing on the advancement of manufacturing technologies that enhance the capabilities of semiconductor devices.

Collaborations: Throughout his career, Fudo has collaborated with other experts in the field, including Toshihide Kawachi and Toshiharu Miwa. Their teamwork and combined knowledge contribute to the innovative breakthroughs in semiconductor manufacturing processes.

Conclusion: Hidekimi Fudo’s work exemplifies the intersection of innovation and practical application within the semiconductor industry. His patented technologies not only reflect his expertise but also set a benchmark for future advancements in the manufacturing of semiconductor devices. As the industry continues to evolve, Fudo's contributions will surely play a pivotal role in shaping its future.

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