Kurokawa-gun, Japan

Hideki Yuasa

USPTO Granted Patents = 4 

Average Co-Inventor Count = 2.4

ph-index = 1


Location History:

  • Kurokawa-gun, JP (2014)
  • Nirasaki, JP (2024)
  • Yamanashi, JP (2024)

Company Filing History:


Years Active: 2014-2024

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4 patents (USPTO):

Title: Innovations of Inventor Hideki Yuasa

Introduction

Hideki Yuasa is a notable inventor based in Kurokawa-gun, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 4 patents. His work focuses on improving cleaning methods and film formation processes in plasma processing apparatuses.

Latest Patents

Yuasa's latest patents include a cleaning method and a plasma treatment device. The cleaning method is designed for cleaning a plasma processing apparatus that performs plasma processing on a substrate. This method involves forming a protective film and subsequently cleaning the interior of the processing container. The protective film is formed in the plasma generation region by generating plasma while supplying a film-forming gas. The cleaning process involves generating plasma while supplying a cleaning gas into the processing container.

Another significant patent is a film forming method and apparatus. This method allows for the continuous formation of a film on a substrate using a processing container that contains aluminum. The process includes cleaning the interior of the processing container with a fluorine-containing gas and performing a post-process by generating plasma of an oxygen- and hydrogen-containing gas. These steps are repeated to ensure efficient film formation.

Career Highlights

Yuasa is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has allowed him to develop innovative solutions that enhance the efficiency and effectiveness of plasma processing technologies.

Collaborations

Throughout his career, Yuasa has collaborated with notable colleagues, including Yutaka Fujino and Hiroyuki Ikuta. These collaborations have contributed to the advancement of technology in their field.

Conclusion

Hideki Yuasa's contributions to plasma processing technology through his patents and work at Tokyo Electron Limited highlight his innovative spirit and dedication to advancing the industry. His inventions continue to influence the development of efficient processing methods in electronics manufacturing.

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