Gunma, Japan

Hideki Shigeno


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: **Innovator Spotlight: Hideki Shigeno**

Introduction

Hideki Shigeno, a dedicated inventor based in Gunma, Japan, has made significant contributions to the field of silicon wafer technology. With a keen focus on enhancing the production methods and evaluation techniques for silicon wafers, Shigeno's work stands out for its innovative approach and practical application.

Latest Patents

Shigeno holds a patent for a groundbreaking invention titled "Silicon wafer and production method thereof and evaluation method for silicon wafer." This patent describes a silicon wafer obtained by slicing a silicon single crystal ingot grown by the Czochralski method, with or without nitrogen doping. The innovation introduces a silicon wafer with an NV-region, an OSF ring region, or a combination of both across its entire plane, while maintaining an interstitial oxygen concentration of 14 ppma or less. His method not only ensures stable oxygen precipitation, regardless of the crystal’s position during device production but also offers a systematic way to evaluate defect regions of the silicon wafer, particularly in cases where pulling conditions are unknown.

Career Highlights

Shigeno is associated with Shin-Etsu Handotai Co., Ltd., a leading player in the silicon wafer manufacturing industry. His career is marked by his commitment to research and development, with his latest patent reflecting his extensive knowledge and expertise in silicon fabrication processes.

Collaborations

Throughout his career, Hideki Shigeno has collaborated with notable coworkers such as Hiroshi Takeno and Makoto Iida. Working together, they have contributed to advancing the technology surrounding silicon wafers, fostering innovation in their field through teamwork and shared expertise.

Conclusion

Hideki Shigeno represents a remarkable figure in the realm of silicon wafer innovations. His patent not only reflects his personal dedication to improving silicon technology but also serves as a vital resource for enhancing production efficiency and defect evaluation processes in the industry. As technology continues to evolve, Shigeno's contributions will undoubtedly play a crucial role in shaping the future of semiconductor manufacturing.

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