Company Filing History:
Years Active: 2002-2005
Title: Innovations of Hideki Satou in Thin Film Fabrication
Introduction
Hideki Satou is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of thin film fabrication, holding a total of 2 patents. His work focuses on optimizing the process of thin film creation through innovative methods and apparatus.
Latest Patents
Satou's latest patents include a thin film fabrication method and a thin film fabrication apparatus. These inventions involve the fabrication of thin films by causing ions in a plasma to be incident through a biasing effect relative to the space potential of the plasma. The method utilizes a bias system that varies the substrate surface potential in a pulse form, optimizing ion incidence. The control section manages the pulse frequency, pulse period, pulse width, and pulse height to ensure that the ion incidence energy temporarily crosses the thin film sputtering threshold value during the pulse period.
Career Highlights
Hideki Satou is currently associated with Anelva Corporation, where he continues to develop and refine his innovative techniques in thin film fabrication. His expertise in this area has positioned him as a key figure in advancing the technology used in various applications.
Collaborations
Throughout his career, Satou has collaborated with notable colleagues, including Shigeru Mizuno and Makoto Satou. These partnerships have contributed to the development of cutting-edge technologies in the field.
Conclusion
Hideki Satou's contributions to thin film fabrication through his innovative patents and collaborations highlight his importance in the field of technology. His work continues to influence advancements in various applications, showcasing the impact of his inventions.