This inventor holds 1 USPTO granted patent. Top assignee: Panasonic Corporation. Active years: 2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2010
Title: Innovations by Hideki Otsuka in Semiconductor Fabrication
Introduction
Hideki Otsuka is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor technology. His innovative methods have paved the way for advancements in device fabrication.
Latest Patents
Otsuka holds a patent for a method for fabricating semiconductor devices. This method involves forming interconnect grooves in an insulating film on a substrate. A copper film is then deposited to fill these grooves. The process continues with polishing the copper film to create interconnects, followed by a cleaning process. Finally, moisture around the insulating film is removed in a vacuum, enhancing the reliability of the semiconductor device. He has 1 patent to his name.
Career Highlights
Otsuka is currently employed at Panasonic Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in improving the efficiency and performance of semiconductor devices.
Collaborations
He has collaborated with notable colleagues such as Norishige Aoki and Shinichi Imai. Their combined expertise has contributed to the success of various projects within the company.
Conclusion
Hideki Otsuka's contributions to semiconductor fabrication highlight his role as a key innovator in the industry. His patented methods are essential for advancing technology in this field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile