Mishima, Japan

Hideki Otsuka

This inventor holds 1 USPTO granted patent. Top assignee: Toshiba Samsung Storage Technology Corporation. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideki Otsuka. Retrieved from https://idiyas.com/inventor/hideki-otsuka-5leiej66

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Innovations of Hideki Otsuka

Introduction

Hideki Otsuka is a notable inventor based in Mishima, Japan. He has made significant contributions to the field of optical disc technology. His work has led to advancements that enhance the functionality and efficiency of optical disc apparatuses.

Latest Patents

Otsuka holds a patent for an optical disc apparatus and barcode reading method. This invention involves an optical disc apparatus that reads a barcode recorded on a predetermined area of an optical disc. It includes a reading unit that reads the barcode from multiple tracks on the predetermined area and a barcode data decoding unit that decodes barcode output data from the cumulative value of the barcode data of the multiple tracks.

Career Highlights

Hideki Otsuka is associated with Toshiba Samsung Storage Technology Corporation, where he has been instrumental in developing innovative storage solutions. His expertise in optical disc technology has positioned him as a key figure in the industry.

Collaborations

Otsuka has worked alongside Yoshiaki Shimada, contributing to various projects that focus on enhancing optical disc technology.

Conclusion

Hideki Otsuka's contributions to optical disc technology through his patent and work at Toshiba Samsung Storage Technology Corporation highlight his role as an influential inventor in the field. His innovations continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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