This inventor holds 3 USPTO granted patents. Top assignee: The Nippon Synthetic Chemical Industry Co., Ltd.. Active years: 2004-2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Ibaraki, JP (2004 - 2006)
- Osaka, JP (2015)
Company Filing History:
Years Active: 2004-2015
Title: The Innovations of Hideki Oono
Introduction
Hideki Oono is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of materials science, particularly in the development of polyvinyl alcohol films. With a total of 3 patents to his name, Oono's work has garnered attention for its innovative applications.
Latest Patents
Oono's latest patents include advancements in polyvinyl alcohol films and polarizing films. One of his notable inventions is a polyvinyl alcohol film that boasts a width of 3 meters or more, with an in-plane retardation value of 30 nm or less and a fluctuation of in-plane retardation value of 15 nm or less. Another significant patent is for a water-soluble film made from a resin composition that includes an anionic group-modified polyvinyl alcohol. This film exhibits excellent water solubility and remains stable even when in contact with chemicals containing boric acid substances.
Career Highlights
Oono is currently employed at the Nippon Synthetic Chemical Industry Co., Ltd., where he continues to innovate and develop new materials. His work has been instrumental in advancing the applications of polyvinyl alcohol in various industries.
Collaborations
Throughout his career, Oono has collaborated with esteemed colleagues such as Syuichi Kitamura and Tomoyoshi Mizutani. These partnerships have contributed to the successful development of his patented technologies.
Conclusion
Hideki Oono's contributions to the field of materials science, particularly through his patents on polyvinyl alcohol films, highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and pave the way for future developments.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile