Sakai City, Japan

Hideki Nakada

This inventor holds 1 USPTO granted patent. Top assignee: Sharp Kabushiki Kaisha Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideki Nakada. Retrieved from https://idiyas.com/inventor/hideki-nakada-mwp6rjch

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Hideki Nakada

Introduction

Hideki Nakada is a notable inventor based in Sakai City, Japan. He has made significant contributions to the field of display technology. His work focuses on enhancing the functionality and efficiency of display devices.

Latest Patents

One of Nakada's key patents is titled "Display device and method of manufacturing display device." This patent describes a display device that includes a through hole provided through a resin layer and all layers that are provided as overlying and underlying layers of the resin layer. The invention also features a non-display area that includes a slit formed to surround at least a part of the through hole. This slit has two opposing side faces, with at least one face having an upper portion that includes inorganic insulating films. The design aims to improve the overall performance and durability of display devices.

Career Highlights

Hideki Nakada is associated with Sharp Kabushiki Kaisha Corporation, a leading company in the electronics industry. His work at Sharp has allowed him to contribute to innovative technologies that enhance consumer electronics.

Conclusion

Hideki Nakada's contributions to display technology through his patent demonstrate his commitment to innovation in the field. His work continues to influence advancements in display devices, showcasing the importance of inventors in driving technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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