Sendai, Japan

Hideki Matsuhashi

This inventor holds 1 USPTO granted patent. Top assignee: Canon Kabushiki Kaisha. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideki Matsuhashi. Retrieved from https://idiyas.com/inventor/hideki-matsuhashi-s4au2d1o

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Innovations of Hideki Matsuhashi

Introduction

Hideki Matsuhashi is a notable inventor based in Sendai, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced coatings. His work has implications for various industries, including electronics and manufacturing.

Latest Patents

Matsuhashi holds a patent for a "Process for forming amorphous titanium silicon nitride on substrate." This innovative process enhances the performance and durability of substrates used in various applications. His patent portfolio includes 1 patent, showcasing his expertise in this specialized area.

Career Highlights

Matsuhashi is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and optical products. His role at Canon allows him to work on cutting-edge technologies that push the boundaries of what is possible in the field. His contributions have been instrumental in advancing the company's research and development efforts.

Collaborations

Throughout his career, Matsuhashi has collaborated with talented individuals such as Kazuo Tsubouchi and Kazuya Masu. These partnerships have fostered innovation and have led to the successful development of new technologies.

Conclusion

Hideki Matsuhashi's work exemplifies the spirit of innovation in materials science. His contributions, particularly in the area of titanium silicon nitride coatings, highlight the importance of research and collaboration in driving technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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