Yokohama, Japan

Hideki Kanai

This inventor holds 1 USPTO granted patent. Top assignee: Kioxia Corporation. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideki Kanai. Retrieved from https://idiyas.com/inventor/hideki-kanai-jv8own10

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Innovations of Hideki Kanai

Introduction

Hideki Kanai is a prominent inventor based in Yokohama, Kanagawa, Japan. He is known for his contributions to the field of semiconductor technology. With a focus on innovative manufacturing methods, Kanai has made significant strides in enhancing the efficiency and effectiveness of semiconductor devices.

Latest Patents

Kanai holds a patent for a "Template, template manufacturing method, and semiconductor device manufacturing method." This patent describes a template that features a transferring pattern on a substrate's first surface. The transferring pattern includes a first projecting portion with a specific height and direction, as well as a second projecting portion that extends higher than the first. Additionally, the patent outlines the arrangement of columnar portions that overlap with the projecting portions, contributing to the overall functionality of the semiconductor device.

Career Highlights

Kanai is currently associated with Kioxia Corporation, a leading company in the semiconductor industry. His work at Kioxia has allowed him to collaborate with other talented professionals, further advancing the field of semiconductor technology.

Collaborations

Some of Kanai's notable coworkers include Kazuhiro Takahata and Toshiaki Komukai. Their combined expertise has fostered an environment of innovation and creativity within their projects.

Conclusion

Hideki Kanai's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence advancements in manufacturing methods and device efficiency.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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