Suwa, Japan

Hideki Horiuchi

This inventor holds 1 USPTO granted patent. Top assignee: Seiko Epson Corporation. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideki Horiuchi. Retrieved from https://idiyas.com/inventor/hideki-horiuchi-ii6uzvve

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 25(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: The Innovations of Hideki Horiuchi

Introduction

Hideki Horiuchi is a notable inventor based in Suwa, Japan. He is recognized for his contributions to the field of technology, particularly in the area of relief pattern transfer methods. Horiuchi's work has led to advancements that benefit various applications in the industry.

Latest Patents

Horiuchi holds a patent for a "Transfer method for relief patterns." This innovation showcases his expertise and commitment to enhancing manufacturing processes. His patent portfolio includes 1 patent, reflecting his focused contributions to the field.

Career Highlights

Horiuchi is currently employed at Seiko Epson Corporation, a leading company in the technology sector. His role at Epson allows him to apply his inventive skills in a collaborative environment, driving forward the company's mission of innovation.

Collaborations

Throughout his career, Horiuchi has worked alongside talented colleagues such as Koichi Kobayashi and Wataru Iwanami. These collaborations have fostered a creative atmosphere that encourages the development of groundbreaking technologies.

Conclusion

Hideki Horiuchi's contributions to the field of technology, particularly through his patent for relief pattern transfer methods, highlight his innovative spirit and dedication to advancing industry standards. His work at Seiko Epson Corporation and collaborations with esteemed colleagues further emphasize his impact on the technological landscape.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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