Tokyo, Japan

Hidekazu Oiwa

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Nec Corporation. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hidekazu Oiwa. Retrieved from https://idiyas.com/inventor/hidekazu-oiwa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Innovations of Hidekazu Oiwa

Introduction

Hidekazu Oiwa is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of optimization systems, particularly through his innovative patent. His work reflects a deep understanding of linear models and their applications in various regions.

Latest Patents

Oiwa holds a patent for a "Region Linear Model Optimization System, Method and Program." This invention optimizes a region linear model and includes a linear model setting unit that partitions an input space into two portions. Additionally, it features a region model calculation unit that represents a model of each region as a linear combination of the linear models applied to the respective regions. This patent showcases his expertise in creating efficient optimization systems.

Career Highlights

Hidekazu Oiwa is associated with NEC Corporation, a leading technology company known for its innovative solutions. His role at NEC has allowed him to work on cutting-edge technologies and contribute to advancements in optimization systems. His dedication to research and development has positioned him as a key figure in his field.

Collaborations

Oiwa collaborates with Ryohei Fujimaki, a fellow innovator. Their partnership exemplifies the spirit of teamwork in the pursuit of technological advancements.

Conclusion

Hidekazu Oiwa's contributions to the field of optimization systems through his patent demonstrate his innovative spirit and technical expertise. His work continues to influence advancements in technology and optimization methodologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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