Company Filing History:
Years Active: 2018-2021
Title: The Innovations of Hidekazu Nishimura
Hidekazu Nishimura is a notable inventor based in Hachioji, Japan. He has made significant contributions to the field of deposition apparatus technology, holding two patents that showcase his innovative spirit and technical expertise.
Latest Patents
Nishimura's latest patents include advanced deposition apparatuses designed to enhance film formation processes. The first patent describes a deposition apparatus that features a plasma generator capable of generating plasma through arc discharge. This apparatus includes a deposition unit that forms a film on a member using the generated plasma. The plasma generator is equipped with a target holder that applies a negative potential to the target, an anode with a positive potential, and a capture mechanism for droplets from the target. The anode is designed with an opening, allowing the capture to be arranged within it.
The second patent outlines another deposition apparatus that comprises a source unit for generating plasma via arc discharge. This apparatus includes a deposition unit where a deposition target material is exposed to the plasma generated in the source unit. Additionally, it features an induction unit that facilitates the transfer of plasma from the source unit to the deposition unit. The induction unit consists of a partition unit that is airtight and connects both units while allowing plasma to pass through. It also includes multiple magnet units that create a magnetic field to induce plasma within the partition unit, with the ability to adjust the connection angle of these magnet units.
Career Highlights
Hidekazu Nishimura is currently employed at Canon Anelva Corporation, where he continues to develop innovative technologies in the field of deposition apparatuses. His work has significantly impacted the efficiency and effectiveness of film formation processes in various applications.
Collaborations
Nishimura collaborates with talented individuals such as Masahiro Atsumi and Masahiro Shibamoto, contributing to a dynamic and innovative work environment.
Conclusion
Hidekazu Nishimura's contributions to the field of deposition apparatus technology reflect his dedication to innovation and excellence. His patents demonstrate a commitment to advancing technology and improving processes in film formation.