The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2021
Filed:
Dec. 30, 2016
Applicant:
Canon Anelva Corporation, Kawasaki, JP;
Inventors:
Masahiro Atsumi, Fuchu, JP;
Hidekazu Nishimura, Hachioji, JP;
Masahiro Shibamoto, Hachioji, JP;
Hiroshi Yakushiji, Tokyo, JP;
Assignee:
CANON ANELVA CORPORATION, Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H05H 1/10 (2006.01); C23C 14/06 (2006.01); C23C 14/32 (2006.01); C23C 14/56 (2006.01); C23C 16/458 (2006.01); C23C 16/50 (2006.01); H05H 1/48 (2006.01);
U.S. Cl.
CPC ...
H05H 1/10 (2013.01); C23C 14/0605 (2013.01); C23C 14/325 (2013.01); C23C 14/564 (2013.01); C23C 16/458 (2013.01); C23C 16/50 (2013.01); H01J 37/32055 (2013.01); H05H 1/48 (2013.01);
Abstract
A deposition apparatus includes a plasma generator for generating a plasma by arc discharge, and a deposition unit for forming a film on a member by the plasma generated by the plasma generator. The plasma generator includes a target holder for holding a target and applying a negative potential to the target, an anode to which a positive potential is applied, and a capture for capturing droplets from the target. The anode has an opening, and the capture is arranged in the opening.