Osaka, Japan

Hidekazu Kawatoko

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi Maxell, Limited. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hidekazu Kawatoko. Retrieved from https://idiyas.com/inventor/hidekazu-kawatoko

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Innovations of Hidekazu Kawatoko in Magnetic Recording Technology.

Introduction

Hidekazu Kawatoko is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of magnetic recording technology. His innovative approach has led to the development of a unique method for manufacturing magnetic recording media.

Latest Patents

Kawatoko holds a patent for a "Magnetic recording medium and method for manufacturing the same." This patent outlines a method that includes a magnetic layer forming step, which involves a drying process. The drying process consists of three stages: a pre-heating stage, a constant rate drying stage, and a falling rate drying stage. The method ensures that the magnetic coating film is properly hardened, enhancing its performance and reliability. He has 1 patent to his name.

Career Highlights

Kawatoko is associated with Hitachi Maxell, Limited, where he has been instrumental in advancing magnetic recording technologies. His work has contributed to the company's reputation as a leader in the field of electronic components and media.

Collaborations

Kawatoko has collaborated with notable colleagues such as Hisanobu Mikamo and Makoto Shiokawa. Their combined expertise has fostered innovation and development in their projects.

Conclusion

Hidekazu Kawatoko's contributions to magnetic recording technology exemplify the impact of innovative thinking in the field. His patent and collaborative efforts continue to influence advancements in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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