Kudamatsu, Japan

Hideji Yamamoto

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideji Yamamoto. Retrieved from https://idiyas.com/inventor/hideji-yamamoto-yph4q5si

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: Innovations of Hideji Yamamoto in Plasma Treatment Technology

Introduction

Hideji Yamamoto is a notable inventor based in Kudamatsu, Japan. He has made significant contributions to the field of plasma treatment technology. His innovative approach has led to advancements that enhance the uniformity of treatment processes for various samples.

Latest Patents

Yamamoto holds a patent for a plasma treating method and apparatus. This invention involves a method that monitors the energies of plasmas corresponding to multiple samples. The process includes adjusting the energies to equalize them based on monitored values. This simultaneous treatment of samples with equalized plasma energies improves the uniformity of the treatment across different surfaces.

Career Highlights

Yamamoto is associated with Hitachi, Ltd., where he has been instrumental in developing advanced plasma treatment technologies. His work has been recognized for its impact on improving manufacturing processes and product quality.

Collaborations

Yamamoto has collaborated with notable colleagues, including Katsuyoshi Kudo and Katsuyasu Nishita. These partnerships have fostered innovation and contributed to the success of various projects within the field.

Conclusion

Hideji Yamamoto's contributions to plasma treatment technology exemplify the importance of innovation in enhancing manufacturing processes. His work continues to influence the industry and improve treatment uniformity for various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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