Kanagawa, Japan

Hideichi Kawaguchi

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Kabushiki Kaisha Toshiba. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideichi Kawaguchi. Retrieved from https://idiyas.com/inventor/hideichi-kawaguchi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: The Innovations of Hideichi Kawaguchi

Introduction

Hideichi Kawaguchi is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of semiconductor manufacturing. His innovative methods have paved the way for advancements in technology.

Latest Patents

Kawaguchi holds a patent for a method of manufacturing semiconductor devices. This method involves preparing a semiconductor substrate with a natural oxide film on its surface. It includes forming an adsorption enhancement layer and an impurity adsorption layer, followed by thermally diffusing impurities into the substrate. This innovative approach enhances the efficiency of semiconductor devices.

Career Highlights

Kawaguchi is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work has been instrumental in developing new manufacturing techniques that improve the performance of semiconductor devices. His expertise in this area has made him a valuable asset to his organization.

Collaborations

Kawaguchi has collaborated with notable colleagues such as Yoshitaka Tsunashima and Kikuo Yamabe. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Hideichi Kawaguchi's contributions to semiconductor manufacturing highlight his role as a key inventor in the technology industry. His innovative methods continue to influence advancements in semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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