Itoigawa, Japan

Hidehito Otsuka

This inventor holds 2 USPTO granted patents. Top assignee: Denka Company Limited. Active years: 2016-2025.


% Patents Active = 100.0

Average Co-Inventor Count = 2.7

ph-index = 1


Company Filing History:


Years Active: 2016-2025

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2 patents (USPTO):Explore Patents

Title: Innovations of Hidehito Otsuka

Introduction

Hidehito Otsuka is a notable inventor based in Itoigawa, Japan. He has made significant contributions to the field of polymer chemistry, particularly in the development of chloroprene copolymer latex and polychloroprene latex. His work has led to advancements in materials that are essential for various industrial applications.

Latest Patents

Otsuka holds 2 patents that showcase his innovative approach. His latest patents include a chloroprene copolymer latex and a method for producing the same, as well as a vulcanized product and dip molded article. The chloroprene copolymer latex contains a structural unit derived from chloroprene and a structural unit derived from 2,3-dichloro-1,3-butadiene. The latex is characterized by a toluene insoluble content of 50 to 95% by mass, and it exhibits a modulus at 500% elongation of a film that is 4.0 MPa or less. Additionally, his work on polychloroprene latex aims to improve rubber coagulability, resulting in a film that demonstrates superior strength through dip molding.

Career Highlights

Otsuka is currently associated with Denka Company Limited, where he continues to push the boundaries of material science. His research and development efforts have positioned him as a key figure in the industry, contributing to the advancement of polymer technologies.

Collaborations

He has collaborated with notable coworkers such as Masao Onozuka and Kiyoshi Sunada, further enhancing the innovative environment in which he works.

Conclusion

Hidehito Otsuka's contributions to the field of polymer chemistry through his patents and collaborations highlight his role as a significant inventor. His work continues to influence the development of advanced materials in various applications.

Profile summary based on public USPTO records.
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