Baraki, Japan

Hidehito Nishizawa

This inventor holds 1 USPTO granted patent. Top assignee: Sekisui Chemical Co., Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hidehito Nishizawa. Retrieved from https://idiyas.com/inventor/hidehito-nishizawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: The Innovations of Hidehito Nishizawa

Introduction

Hidehito Nishizawa is a notable inventor based in Baraki, Japan. He has made significant contributions to the field of materials science, particularly in the development of diamond particles. His innovative work has led to the creation of a patented method that enhances the properties of diamond-containing compositions.

Latest Patents

Nishizawa holds a patent for "Diamond particles, diamond-containing composition, and method for producing diamond particles." This invention focuses on diamond particles that exhibit an ionic conductivity of 0.8 mS/m or lower. The patent outlines a method for producing these diamond particles, which can have various applications in electronics and materials engineering.

Career Highlights

Nishizawa is currently employed at Sekisui Chemical Co., Ltd., where he continues to push the boundaries of material innovation. His work at the company has been instrumental in advancing the understanding and application of diamond materials in various industries.

Collaborations

Some of his notable coworkers include Masataka Sugimoto and Taku Sasaki. Their collaborative efforts contribute to the innovative environment at Sekisui Chemical Co., Ltd.

Conclusion

Hidehito Nishizawa's contributions to the field of diamond materials exemplify the spirit of innovation. His patented work not only showcases his expertise but also opens new avenues for research and application in materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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