Yokohama, Japan

Hidehiko Ino

This inventor holds 1 USPTO granted patent. Top assignee: Fujitsu Corporation. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hidehiko Ino. Retrieved from https://idiyas.com/inventor/hidehiko-ino

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Innovations of Hidehiko Ino

Introduction

Hidehiko Ino is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of log management through his innovative patent. His work focuses on improving the efficiency of log information processing, which is crucial for application deployment and management.

Latest Patents

Hidehiko Ino holds a patent for a log management method, log management system, and information processing apparatus. This patent involves a method that extracts message format information from the source code of an application before deploying it. The application compresses and outputs log information, and the method ensures that the log information is output in a message format when accessed by a device capable of obtaining it. He has 1 patent to his name.

Career Highlights

Ino is currently employed at Fujitsu Corporation, where he continues to develop innovative solutions in information technology. His expertise in log management has positioned him as a valuable asset to his team and the company.

Collaborations

Some of his coworkers include Kenichi Yamashita and Kazuo Mineno, who collaborate with him on various projects within Fujitsu Corporation.

Conclusion

Hidehiko Ino's contributions to log management technology exemplify the importance of innovation in the field of information processing. His patent reflects a commitment to enhancing application efficiency and reliability.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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