Otsu, Japan

Hideaki Toyama

This inventor holds 1 USPTO granted patent. Top assignee: Toray Industries, Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideaki Toyama. Retrieved from https://idiyas.com/inventor/hideaki-toyama-qmkjaf18

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: The Innovations of Hideaki Toyama

Introduction

Hideaki Toyama is a notable inventor based in Otsu, Japan. He has made significant contributions to the field of materials science, particularly in the development of multi-layer sheets with advanced properties.

Latest Patents

One of Toyama's key inventions is a laminated sheet designed to provide excellent electromagnetic wave shielding properties. This multi-layer sheet consists of an alternating multilayer unit with five or more A and B layers laminated together. The invention ensures that the electromagnetic return loss at the peak top in the return loss spectrum is 5 dB or more, showcasing its effectiveness in shielding applications.

Career Highlights

Hideaki Toyama is associated with Toray Industries, Inc., a leading company in advanced materials. His work at Toray has allowed him to focus on innovative solutions that address modern technological challenges.

Collaborations

Toyama has collaborated with talented coworkers, including Hisato Matsui and Wataru Gouda, to further enhance the development of his inventions.

Conclusion

Hideaki Toyama's contributions to the field of electromagnetic shielding through his innovative laminated sheet exemplify the importance of research and development in advancing technology. His work continues to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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