Shunan, Japan

Hideaki Kawai

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Tokuyama Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideaki Kawai. Retrieved from https://idiyas.com/inventor/hideaki-kawai-dp7lqxgo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.4

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Innovations by Hideaki Kawai

Introduction

Hideaki Kawai is a notable inventor based in Shunan, Japan. He has made significant contributions to the field of materials science, particularly in the development of silicon nitride powders and substrates. With a total of 2 patents, Kawai's work has implications for various industrial applications.

Latest Patents

Kawai's latest patents include a silicon nitride powder for sintering and a silicon nitride sintered substrate. The silicon nitride powder for sintering is characterized by its fine powdery form, which exhibits minimal increase in oxygen concentration over time and excellent storage stability. This powder has a specific surface area of 5 to 30 m/g and a hydrophobicity (M value) of 30 or more. Notably, it shows an increase in oxygen concentration of 0.30% by mass or less after being left in a humid environment for 48 hours. The powder can be produced by dry-pulverizing aggregated masses of silicon nitride in an inert atmosphere with a silane coupling agent.

The silicon nitride sintered substrate addresses contamination issues caused by boron nitride powders used as releasing agents. It also improves bonding strength and dielectric strength during the lamination of metal layers. The substrate is designed to have a cumulative volume of pores with diameters ranging from 1 to 10 μm not exceeding 7.0×10 mL/cm, as measured by mercury porosimetry. Additionally, the surface roughness (Ra) is maintained at no more than 0.6 μm, and the arithmetic mean peak curvature (Spc) is limited to 4.5 [1/mm].

Career Highlights

Kawai is currently employed at Tokuyama Corporation, where he continues to innovate in the field of materials science. His work has garnered attention for its practical applications and contributions to technology.

Collaborations

Kawai has collaborated with notable colleagues, including Norihira Mitsumura and Satoru Wakamatsu, enhancing the impact of his research through teamwork and shared expertise.

Conclusion

Hideaki Kawai's contributions to the field of silicon nitride materials demonstrate his innovative spirit and commitment to advancing technology. His patents reflect a deep understanding of material properties and their applications in industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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