Saitama, Japan

Hideaki Katoh

This inventor holds 10 USPTO granted patents, plus 1 CIPO patent. Top assignees: Dai-Ichi Seiko Co., Ltd., Enplas Corporation. Active years: 1991-1998.


% Patents Active = 100.0


Average Co-Inventor Count = 4.4

ph-index = 7

Forward Citations = 132(Granted Patents)


Location History:

  • Saitama, JP (1991 - 1995)
  • Saitama-ken, JP (1997 - 1998)

Company Filing History:


Years Active: 1991-1998

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10 patents (USPTO):Explore Patents

Title: Innovations of Hideaki Katoh

Introduction

Hideaki Katoh is a prominent inventor based in Saitama, Japan. He has made significant contributions to the field of light source technology, holding a total of 10 patents. His innovative designs have enhanced the efficiency and effectiveness of surface light source devices.

Latest Patents

One of his latest patents is a surface light source device that comprises at least one light source, a transparent panel, a diffusing panel, and a reflecting surface. This device is designed to enhance brightness in a direction perpendicular to the diffusing panel. It achieves this by incorporating a transparent sheet with protrusions that have a saw-tooth-like sectional shape on the front surface of the transparent panel. This innovative design allows for improved light distribution and efficiency.

Career Highlights

Throughout his career, Hideaki Katoh has worked with notable companies such as Dai-ichi Seiko Co., Ltd. and Enplas Corporation. His experience in these organizations has contributed to his expertise in developing advanced lighting technologies.

Collaborations

Hideaki has collaborated with several talented individuals in his field, including Isamu Kaneko and Nobuhisa Noguchi. These collaborations have fostered innovation and creativity in his projects.

Conclusion

Hideaki Katoh's contributions to the field of light source technology are noteworthy. His patents reflect a commitment to innovation and improvement in lighting solutions. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
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