Yamanashi, Japan

Hideaki Inoue

This inventor holds 1 USPTO granted patent. Top assignee: Nisca Corporation. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideaki Inoue. Retrieved from https://idiyas.com/inventor/hideaki-inoue-i0gvmpnr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Innovations of Hideaki Inoue

Introduction

Hideaki Inoue is a notable inventor based in Yamanashi-ken, Japan. He has made significant contributions to the field of image reading technology. His work focuses on enhancing the quality and reproducibility of image data from documents with varying gloss levels.

Latest Patents

Inoue holds a patent for an image reading apparatus. This innovative device is designed to read images of document images that have different gloss levels. The apparatus includes a data processor that utilizes both a regular reflection light source and a diffuse reflection light source. It generates image data based on the outputs obtained from a photoelectric converter, ensuring high-quality image reproduction.

Career Highlights

Inoue is currently employed at Nisca Corporation, where he continues to develop advanced imaging technologies. His expertise in the field has led to the creation of solutions that improve the efficiency and accuracy of image reading processes.

Collaborations

Inoue collaborates with fellow inventor Yoshihiko Minagawa. Together, they work on projects that push the boundaries of imaging technology and enhance the capabilities of their inventions.

Conclusion

Hideaki Inoue's contributions to the field of image reading technology exemplify his innovative spirit and dedication to improving document imaging. His patent for the image reading apparatus showcases his ability to address complex challenges in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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