This inventor holds 1 USPTO granted patent. Top assignee: Wisconsin Alumni Research Foundation. Active years: 2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2016
Title: Hewei Liu: Inventor of a Tunable Fresnel Zone Plate
Introduction
Hewei Liu is an inventor associated with Madison, Wisconsin, and the Wisconsin Alumni Research Foundation. His work includes an invention for adjusting the focal length of a Fresnel zone plate through a mechanically stretchable structure.
Latest Patents
Liu is credited with 1 patent, titled “Fresnel zone plate.” The invention describes a wafer with alternating transparent and opaque zones, with silicon nanowires extending into the opaque zones. A mechanically stretchable tuning structure is mounted on the wafer, and stretching it varies the zone plate’s focal length. The patent description refers to the wafer’s mounting surface.
Career Highlights
The available information identifies Liu’s patent work and his association with the Wisconsin Alumni Research Foundation. The invention combines Fresnel zone plate optics with a mechanical tuning approach.
Collaborations
Liu’s listed coworkers include Yen-Sheng Lu and Hongrui Jiang. Their names are provided as colleagues, though the available information does not specify their roles in this patent.
Conclusion
Hewei Liu’s patent presents a mechanically adjustable Fresnel zone plate designed to vary its focal length, reflecting his documented inventive work associated with the Wisconsin Alumni Research Foundation.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile