Suwon-si, Gyeonggi-do, South Korea

Heungsuk Oh

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Heungsuk Oh. Retrieved from https://idiyas.com/inventor/heungsuk-oh-5p246wg8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Heungsuk Oh: Innovator in Optical Proximity Correction

Introduction

Heungsuk Oh is a prominent inventor based in Suwon-si, Gyeonggi-do, South Korea. He is known for his contributions to the field of optical proximity correction, which plays a crucial role in photomask fabrication. His innovative work has led to the development of significant technologies that enhance manufacturing processes in the semiconductor industry.

Latest Patents

Heungsuk Oh holds a patent titled "Optical Proximity Correction Method and Photomask Fabrication Method Using the Same." This patent showcases his expertise in improving the accuracy and efficiency of photomask production, which is essential for semiconductor manufacturing. He has 1 patent to his name, reflecting his impactful contributions to the field.

Career Highlights

Heungsuk Oh is currently employed at Samsung Electronics Ltd., a leading global technology company. His role at Samsung has allowed him to work on cutting-edge technologies and collaborate with some of the brightest minds in the industry. His dedication to innovation has positioned him as a key player in the advancement of optical technologies.

Collaborations

Heungsuk Oh has collaborated with notable colleagues, including Joobyoung Kim and Sangwook Kim. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking solutions in the field of optical proximity correction.

Conclusion

Heungsuk Oh's contributions to optical proximity correction and photomask fabrication have made a significant impact on the semiconductor industry. His innovative spirit and collaborative efforts continue to drive advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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