Ichon-shi, South Korea

Heung-Sik Kwak


Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 23(Granted Patents)


Location History:

  • Kyoungki-do, KR (2002)
  • Ichon-shi, KR (2003)

Company Filing History:


Years Active: 2002-2003

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2 patents (USPTO):Explore Patents

Title: Heung-Sik Kwak: Innovator in Semiconductor Technology

Introduction

Heung-Sik Kwak is a prominent inventor based in Ichon-shi, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His innovative methods have advanced the manufacturing processes used in semiconductor devices.

Latest Patents

Kwak's latest patents include a "Method for manufacturing aluminum oxide film for use in a semiconductor device." This method involves several steps, including preparing a semiconductor substrate, supplying modified trimethyl aluminum (MTMA) as an aluminum source, and discharging unreacted materials through a vacuum process. Another notable patent is the "Method for forming a lower electrode by using an electroplating method." This method allows for the creation of a thick lower electrode made of platinum, which is essential for the functionality of semiconductor devices.

Career Highlights

Heung-Sik Kwak is currently employed at Hyundai Electronics Industries Co. Ltd., where he continues to develop innovative solutions in semiconductor technology. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Kwak has collaborated with notable colleagues, including Chung-Tae Kim and Min-Soo Kim, contributing to various projects that push the boundaries of semiconductor technology.

Conclusion

Heung-Sik Kwak's contributions to semiconductor technology through his patents and work at Hyundai Electronics Industries Co. Ltd. highlight his role as a key innovator in the field. His methods are paving the way for advancements in semiconductor manufacturing.

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