Seoul, South Korea

Heung Hyun Shin

USPTO Granted Patents = 2 

Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2013-2014

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2 patents (USPTO):Explore Patents

Title: Heung Hyun Shin: Innovator in Measurement Technology

Introduction

Heung Hyun Shin is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of measurement technology, particularly in the development of innovative devices that enhance accuracy and efficiency. With a total of 2 patents, his work is recognized for its practical applications in various industries.

Latest Patents

One of Heung Hyun Shin's latest patents is an "Interferometer for TSV measurement and measurement method using same." This invention features a TSV measuring interferometer that utilizes a variable field stop to focus light at both the inlet and the bottom surface of a TSV. This design reduces measurement time and improves data accuracy, especially for TSVs with large aspect ratios. Another notable patent is the "Plasma monitoring device and method." This device includes a plasma supplier, a camera unit for capturing plasma emission images, and a controller that analyzes these images to monitor plasma states in real time. This innovation allows for precise control of the reaction gas supplied to the plasma supplier, ensuring even plasma emission.

Career Highlights

Heung Hyun Shin is currently employed at SNU Precision Co., Ltd., where he continues to develop cutting-edge technologies. His work has significantly impacted the field of measurement and plasma technology, showcasing his expertise and innovative spirit.

Collaborations

Heung Hyun Shin collaborates with talented individuals such as Ki Hun Lee and Heui Jae Pahk. Their combined efforts contribute to the advancement of technology in their respective fields.

Conclusion

Heung Hyun Shin stands out as a key figure in the realm of measurement technology, with his patents reflecting a commitment to innovation and precision. His contributions continue to shape the future of measurement devices and plasma monitoring systems.

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