Saarbruecken, Germany

Herrmann Schirra


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Herrmann Schirra: Innovator in Adhesive Technology

Introduction

Herrmann Schirra, an inventive mind hailing from Saarbruecken, Germany, has made significant contributions to the field of adhesive technology. His pioneering research has led to the development of innovative adhesive compositions that expand the possibilities in various industrial applications.

Latest Patents

Schirra holds a patent for his invention of detachable adhesive compounds. This groundbreaking work relates to adhesive compositions that incorporate a binder system containing nanoscale particles with ferromagnetic, ferrimagnetic, superparamagnetic, or piezoelectric properties. Additionally, the invention addresses dissolvable adhesive bonds and presents a novel process for dissolving such adhesive bonds, offering enhanced versatility and functionality.

Career Highlights

Currently, Herrmann Schirra is associated with Henkel Kommanditgesellschaft Auf Aktien, where he continues to develop and refine innovative adhesive technologies. His role at Henkel positions him at the forefront of adhesive research and development, allowing him to contribute to advancements that can lead to more efficient and effective products.

Collaborations

Schirra works closely with fellow innovators, including Christian N. Kirsten and Peter Christophliemk. This collaborative environment fosters a wealth of ideas and different perspectives that contribute to the success of their projects, further driving innovation in adhesive solutions.

Conclusion

Herrmann Schirra’s contributions to adhesive technology exemplify the spirit of innovation. Through his patent for detachable adhesive compounds and his collaboration with talented colleagues, he is making a lasting impact on the industry, paving the way for future advancements and applications in this critical field.

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