Bietigheim, Germany

Hermann Wurz


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Hermann Wurz: Innovator in Pulsed Ion and Electron Beam Technology

Introduction

Hermann Wurz is a notable inventor based in Bietigheim, Germany. He has made significant contributions to the field of pulsed ion and electron beam technology. His innovative work has led to the development of a unique patent that enhances the generation of large-area pulsed ion and electron beams.

Latest Patents

Hermann Wurz holds a patent for a source for the generation of large-area pulsed ion or electron beams. This invention involves an anode discharge electrode with openings that receive discharge electrodes, forming a vacuum arc plasma source. The discharge is safely triggered by a load that determines the total current, consisting of a parallel circuit including an ohmic resistor and a capacitor. The load output is adapted to the internal resistance of the pulse voltage generator. By dimensioning the electrical components within given limits, a homogeneous beam of charged particles is achieved. The particle composition can either be uniform or a homogeneous mixture of different particles, depending on the choice of electrode materials.

Career Highlights

Hermann Wurz is associated with Forschungszentrum Karlsruhe GmbH, where he has been instrumental in advancing research in his field. His work has not only contributed to theoretical knowledge but also to practical applications in technology.

Collaborations

Hermann has collaborated with notable colleagues, including Vladimir Engelko and Harald Giese. Their combined expertise has furthered the development of innovative technologies in pulsed ion and electron beam generation.

Conclusion

Hermann Wurz's contributions to the field of pulsed ion and electron beam technology exemplify the impact of innovative thinking in scientific research. His patent and collaborative efforts continue to influence advancements in this area.

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