The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 24, 1998

Filed:

May. 30, 1997
Applicant:
Inventors:

Vladimir Engelko, Petersburg, RU;

Harald Giese, Stutensee, DE;

Georg Muller, Karlsruhe, DE;

Sven Schalk, Karlsruhe, DE;

Christoph Schultheiss, Berghausen, DE;

Hermann Wurz, Bietigheim, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
31511121 ; 31511131 ; 31511181 ;
Abstract

In a source for the generation of large-area pulsed ion or electron beams from an anode discharge electrode which has openings receiving discharge electrodes forming a vacuum arc plasma source, the discharge is safely triggered by a load which determines the total current and which consists of a parallel circuit including an ohmic resistor and a capacitor wherein the load output is adapted to the internal resistance of the pulse voltage generator. With a dimensioning of the electrical components taking into consideration given limits, a homogeneous beam of charged particles is obtained wherein the particle composition can be all the same or a homogeneous mixture of different particles depending on the choice of electrode materials.


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