This inventor holds 1 USPTO granted patent. Top assignee: Hoechst Aktiengesellschaft. Active years: 1989.
Company Filing History:
Years Active: 1989
Title: Innovations of Hermann Schmidt in Photoresist Packaging
Introduction
Hermann Schmidt is a notable inventor based in Wiesbaden, Germany. He has made significant contributions to the field of packaging for photoresist materials. His innovative approach addresses critical issues related to humidity and its effects on the processability of photoresist.
Latest Patents
Hermann Schmidt holds a patent for a package designed specifically for dry-resist material. This package is substantially impermeable to water vapor, which prevents humidity-related effects that can adversely influence the processability of the photoresist. The patent details a package that can comprise film tubing, with ends closed by welding or gluing, into which a photoresist roll is placed. The film tubing can be made from a composite material, including a polyester film as the support film, laminated with aluminum foil or vacuum-metallized aluminum, topped with a polyethylene film. Additionally, a tinplate container can be utilized, which is closed by soldering after the photoresist material is placed inside. These packages typically exhibit a permeability to water vapor of less than 0.01 gram per square meter per day, at a humidity gradient of 97% and an ambient temperature of 23°C.
Career Highlights
Hermann Schmidt is associated with Hoechst Aktiengesellschaft, a prominent company in the chemical and pharmaceutical industry. His work has been instrumental in advancing packaging solutions that enhance the stability and usability of photoresist materials.
Collaborations
Hermann has collaborated with Hans Wilski, contributing to the development of innovative packaging solutions in their field.
Conclusion
Hermann Schmidt's contributions to the packaging of photoresist materials demonstrate his commitment to innovation and excellence in the field. His patented solutions address critical challenges, ensuring the reliability and effectiveness of photoresist materials in various applications.