Company Filing History:
Years Active: 1986
Title: Herbert L. Greenhaus: Innovator in Lithography Processes
Introduction
Herbert L. Greenhaus is a notable inventor based in Reston, VA (US). He has made significant contributions to the field of photolithography, particularly with his innovative processes that enhance the precision of photoresist applications. His work has implications for various technologies, including semiconductor manufacturing.
Latest Patents
Herbert L. Greenhaus holds a patent for a "Multi-level resist image reversal lithography process." This patent describes a photoresist photolithographic process that allows for a single development step to develop a dual-layer photoresist. This process is essential for lift-off, reactive ion etching, or ion implantation processes that require precise aperture sizes at the top of the photoresist layer. The method involves depositing two compositionally similar layers, where the first layer is soluble in a developer after exposure to light and baking, while the second layer remains insoluble under the same conditions. This dual characteristic enables tight control over the effective aperture for windows in the composite photoresist, even amidst significant variations in developer concentration and development time.
Career Highlights
Herbert L. Greenhaus has had a distinguished career, primarily associated with the International Business Machines Corporation (IBM). His work at IBM has allowed him to explore and develop advanced lithographic techniques that are crucial for modern manufacturing processes. His innovative approach has positioned him as a key figure in the field of photolithography.
Collaborations
Throughout his career, Herbert has collaborated with esteemed colleagues, including Edward C. Fredericks and Madan M. Nanda. These collaborations have further enriched his work and contributed to advancements in lithography technologies.
Conclusion
Herbert L. Greenhaus is a pioneering inventor whose contributions to lithography processes have had a lasting impact on the industry. His innovative patent and collaborative efforts highlight his commitment to advancing technology in photolithography.
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