Denkendorf, Germany

Herbert Kilgus

This inventor holds 1 USPTO granted patent. Top assignee: Nokia Technology Gmbh. Active years: 1994.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Herbert Kilgus: Innovator in Electron Density Measurement

Introduction

Herbert Kilgus is a notable inventor based in Denkendorf, Germany. He has made significant contributions to the field of electron beam measurement technology. His innovative approach has led to the development of a unique device and process that enhances the accuracy of measuring electron density distributions.

Latest Patents

Kilgus holds a patent for a "Device and process for measuring an electron density distribution." This invention addresses the challenges associated with measuring the radiant density of electron beams from shadow mask tubes. The traditional method involves displacing the beam on a screen and capturing images of the light spot areas. However, this process requires numerous adjustments, making it cumbersome. Kilgus's invention simplifies this by utilizing an image converter camera to produce light spots across the entire field of view. This allows for a more efficient detection of light spot sections and the determination of luminous density distribution.

Career Highlights

Herbert Kilgus is currently associated with Nokia Technology GmbH, where he continues to work on advancements in technology. His expertise in electron beam measurement has positioned him as a valuable asset in his field.

Collaborations

Kilgus has collaborated with notable colleagues, including Joachim Hassler and Jurgen Reinknecht. Their combined efforts have contributed to the development of innovative solutions in their respective areas of expertise.

Conclusion

Herbert Kilgus's work in measuring electron density distributions showcases his innovative spirit and dedication to advancing technology. His contributions have the potential to significantly impact the field of electron beam measurement.

Profile summary based on public USPTO records.
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